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负偏置沉积法可控制备CuO多孔纳米结构薄膜
Authors
刘阳
周磊
+7 more
唐斌
曾祥明
朱贤方
苏江滨
蒋美萍
诸一琦
郎咸忠
Publication date
1 January 2017
Publisher
Abstract
由于具有低成本、无毒、铜源丰富等优点,以及在气敏传感器、太阳能电池、光催化等领域的潜在应用前景,CuO薄膜引起了人们的广泛关注.采用射频平衡磁控溅射镀膜系统,在薄膜沉积过程中通过施加不同衬底负偏压可控制备了CuO多孔纳米结构薄膜.研究发现,所得CuO薄膜具有灵活可调的孔隙度和纳米构筑单元形貌特征,并且它们与衬底负偏压的大小密切相关;薄膜沿衬底法线方向呈柱状生长且具有显著的(111)择优取向;禁带宽度在2.0.35 eV之间可调.很明显地,传统的溅射离子轰击、再溅射理论并不适合用来解释上述负偏压效应,因此在此基础上提出了一种负偏置沉积过程中材料原子或分子在薄膜表面选择性优先沉积机制.国家自然科学基金(51501018,11574255);江苏省自然科学基金(BK20150267,BK20141169);江西省教育厅科技项目(GJJ161197);江西省自然科学基金(20132BAB212005)资助
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Last time updated on 10/06/2020