학위논문 (석사)-- 서울대학교 대학원 : 화학생물공학부, 2013. 2. 이종찬.Various methods for soft lithography have been developed due to the temporal and economical limitations of photo lithography, and still a lot of lithographical methods are being developed and studied to apply to different scientific fields. Here, we focus on nano-scale anisotropic patterns formed from a replica molding with curable polymers. We fabricate a stamp having an array of the patterns newly formed from a hexagonal pattern of tens of nanometers composed of dot-shaped vertices. We could successfully transform the dot-patterned feature to an ellipsoidal one and also manipulate its aspect ratio as desired. Furthermore, we were able to stretch the hexagonal pattern while keeping the dot shape the same, so we came up with a new pattern arrangement. Ultimately, we can notice the change in wetting property of materials having anisotropic structures.1 Introduction
1.1 Soft Lithography
1.2 Patterning based on mechanical stress
1.3 Sub-100 nm scale pattern
1.4 Purpose of this study
2 Experimentals
2.1 Fabrication of the AAO Mold
2.2 Patterning
2.2.1 PUA stamp
2.2.2 Nano patterned PDMS molds
2.2.3 Pore elongation
2.2.4 Rod elongation
2.3 Characterization
3 Results and Discussion
3.1 Sub-100 nm scale PDMS molds
3.1.1 Anodic aluminum oxide
3.1.2 Sub-100 nm patterned PDMS molds
3.2 Shape and arrangement control
3.2.1 Shape analysis
3.2.2 Anisotropic wetting behavior
3.2.3 Strain difference in a PDMS molds
3.3 Arrangement control
4 Conclusion
Reference
국문초록Maste
