374-378<span style="font-size:11.0pt;mso-bidi-font-size:
10.0pt;font-family:" times="" new="" roman","serif";mso-fareast-font-family:"times="" roman";="" mso-ansi-language:en-us;mso-fareast-language:en-us;mso-bidi-language:ar-sa"="" lang="EN-US">The
density and time constant of interface states of Au/Si3N4/n-Si
(MIS) device have been analyzed by conductance method. The capacitance and
conductance measurements of the device have been performed at various
frequencies in the range of 1 kHz-1 MHz. Experimental results show that Gp/ω-log(f)
plots for each voltage value give <span style="font-size:
11.0pt;mso-bidi-font-size:10.0pt;font-family:" times="" new="" roman","serif";="" mso-fareast-font-family:mtsy;mso-ansi-language:en-us;mso-fareast-language:en-us;="" mso-bidi-language:ar-sa"="" lang="EN-US">a peak because of the presence of interface states.
The density (Nss) and time constant () of interface states have been calculated from maximum value of the peak. The values of Nss and
range from 2.49×1013 eV-1cm-2 to 7.57×1012
eV-1cm-2 and from 2.67×10-5s to 1.67×10-5s,
respectively.</span