130-136CdS Thin films of different
thicknesses have been deposited onto glass substrates at 60°C.The
source materials for Cd and S have been used as CdCl2 and NH2-CS-NH2
in ammonia solution respectively. The reaction mechanism involved the
preparation of film onto precleaned glass substrate through Cd2+ and
S2 ions in aqueous solution. Deposited thin films were annealed in
air from 50 to 450oC. The XRD results are presented only for the
films annealed from 300 to 450oC, as below 300oC there is
no appreciable change in crystal structure. From the XRD patterns, films are
seen to be polycrystalline in nature with the formation hexagonal phase. The
crystallinity of the films was improved by annealing in air at 400°C.
The optical transmittance, reflectance and absorption of annealed CdS thin
films with different value of thicknesses are then studied in the energy range
1.1-4.0 eV. The CdS films showed allowed direct optical band gap Eg = 2.38 eV. Films of different
thicknesses have same maximum transmittance intensity at same wavelength, 590
nm but refractive index varies in the range 2.15-2.85. The photoconductivity of
different thicknesses CdS films has been measured with varying light intensity
level as L0.2-L1 and it has been observed that the
photoconductivity is changed. The decay time constants and demarcation time
(60-80 s) have been calculated by photoconductivity measurement and have same
values for all different thicknesses of CdS films. The above results are useful
for low cost photosensor device applications