Three Dimensional Nanochannel Formation by Reflective Interference Lithography

Abstract

An imaging technique using TM polarized illumination at 45 degree incidence to a highly reflective surface has been demonstrated possible. The imaging technique was able to produce a single row of over exposed nanochannels. Further experimentation will be required to develop a stable process where multiple rows of channels can be formed. Once the optimal process is determine, experimentation can be designed to create either or both photonic crystal structures and a pitch doubling technique

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