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Ferroelectric HfO2 Thin Films
Authors
Jackson D. Anderson
Karine Florent
Santosh Kurinec
Publication date
1 May 2015
Publisher
RIT Scholar Works
Abstract
Goal: To enable ferroelectric device research at RIT and to that end: 1.Developing an RIT process for fabrication of ferroelectric HfO2 devices 2.Enabling characterization of said films through set-up of a new ferroelectric test syste
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Last time updated on 06/01/2018
RIT Scholar Works
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:repository.rit.edu:amec-10...
Last time updated on 12/01/2024
