ALTILITH CEM-420WS water soluble contrast enhancement material was used to improve lithographic capabilities of KTI-820 positive photoresist when imaged with a GCA/Mann 4800 DSW g-line 0.28NA Stepper. Improvements in photoresist edge profiles of a two micron line/space pattern were observed using a scanning electron microscope. Experimental data indicated a three fold improvement in V contrast and a significant increase in exposure latitude. The experimental results are contrasted with simulated results using PROLITH photoresist modeling software
