eports the first demonstration of the integration of CMOS and Si/SiGe resonant interband tunnel diode (RITD). In Si-based material, recent breakthrough in Si/SiGe RITD grown using molecular beam epitaxy (MBE) made the integration with CMOS possible. The resultant devices enabled the realization of RITD CMOS circuitry, and a NMOS-RITD MOBILE latch was demonstrated in Si, all enabling digital and ternary circuit design for density storag
