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Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography
Authors
Chanho Jeong
Dongha Tahk
+3 more
Hyowon Tak
Sori Lee
Tae-il Kim
Publication date
1 October 2018
Publisher
IOP PUBLISHING LTD
Abstract
We presented surface energy-tunable nanoscale molds for unconventional lithography. The mold is highly robust, transparent, has a minimized haze, does not contain additives, and is a non-fluorinated isodecyl acrylate and trimethylolpropane triacrylate based polymer. By changing the mixing ratio of the polymer components, the cross-linking density, mechanical modulus, and surface energy (crucial factors in low pressure ((1-2) x 10(5) N m(-2)) low pressure-nanoimprint lithography (LP-NIL)), can be controlled. To verify these properties of the molds, we also characterized the surface energy by measuring the contact angles and calculating the work of adhesion among the wafer, polymer film, and mold for successful demolding in nanoscale structures. Moreover, the molds showed high optical clarity and precisely tunable mechanical and surface properties, capable of replicating sub-100 nm patterns by thermal LP-NIL and UV-NIL. © 2017 IOP Publishing Ltd Printed in the UK
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Last time updated on 06/02/2020