Cs+ ion exchange in RbTiOPO4 and (Yb,Nb):RTP/RTP(001) has been used to locally increase the refractive indices for waveguide circuit fabrication. Ti masks were fabricated on RTP samples by conventional photolithography. Cs+ exchange was done using a CsNO3 melt at 698 K during 2 h. Elemental analysis confirms an Cs+ profile with a variable depth. Apparently the Cs+ exchange is disfavored in the doped epitaxial sample. The refractive index variation is higher for nz than for nx,y. Near-field images of the guided modes at 633, 1064 and 1520 nm were recorded. The optical characterization shows propagation losses of 5 dB/cm at 1520 nm
