Kroesen, GMW Gerrit

Schram, DC Daan

Kroesen, G.M.W.

Schram, D.C.

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 Dynamics of an expanding arc plasma used for plasmadepositionCitation for published version (APA):Kroesen, G. M. W., & Schram, D. C. (1988). Dynamics of an expanding arc plasma used for plasma deposition.In Gordon Research Conference on Plasma Chemistry (10th), Held in Tilton, New Hampshire on August 15-19,1988Document status and date:Published: 01/01/1988Document Version:Accepted manuscript including changes made at the peer-review stagePlease check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can beimportant differences between the submitted version and the official published version of record. Peopleinterested in the research are advised to contact the author for the final version of the publication, or visit theDOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and pagenumbers.Link to publicationGeneral rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright ownersand it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.            • Users may download and print one copy of any publication from the public portal for the purpose of private study or research.            • You may not further distribute the material or use it for any profit-making activity or commercial gain            • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the “Taverne” license above, pleasefollow below link for the End User Agreement:www.tue.nl/taverneTake down policyIf you believe that this document breaches copyright please contact us at:openaccess@tue.nlproviding details and we will investigate your claim.Download date: 04. Oct. 2023Dynamics of an expanding arc plasma used for plasma deposition G.:М.W. Kroesen and D.C. Schram, university of Technology, Dept. of Physics, Р.О. Вох 513, 5600 МВ Eindhoven, the Netherlands. In the reactor that is used in this work the three most important functions ( dissociation and ionization, transport and deposition) are spatially separated, and each of them is optimized separately1. А cascaded arc plasma in argon is used to dissociate and ionize the injected methane and acetylene molecules. The produced reactive particles are transported efficiently towards the substrate Ьу means of а supersonic expansion into vacuum and а subsonic plasma beam. On the substrate an amorphous carbon film is growing. The flowing plasma in the cascaded arc is analyzed with diagnostics and models. The electron density and the electron temperature are measured as а function of position in the arc Ьу means of Stark broadening of the hydrogen н,3-line (486.1 nm) and the ratio of continuum- and line emission respectively. Together with the measured axial pressure profiles these measurements have been used to calculate the profiles of the gas temperature from а best fit of the quasi one-dimensional model to the experimental profiles. Then the overpopulation of the neutгal argon ground level has been calculated. In the beginning of the arc channel tl1is overpopulation amounts to а factoг 40, independent of the gas flow. Energy considerations have shown that а large amount of the dissipated electi-ical energy ( about 60%) is used to heat the originally cold argon gas. The ionization of argon atoms takes the other 40%. The pressure drop over the arc channel is associated with viscous friction bet,veen the arc vvall and the plasma. The flow has been analyzed numerically нsin,g t lle conservation laws for mass, momentum and energy. The oЬtained i-elation betvveen tl1e friction factor and tl1e Reynolds пumber lias а sti-on,g IesemЫance t.o t l1e tl1eoтetical curve for laminar flow throнgl1 а perfectly sшooth duct. Tl1e dissociation of the injected methane is analyzed using the conseп·ation la'NS for mass and energy. Tl1e calculatioпs iпdicate that an aic length of 2 сш afteI i11jectio11 of the methane is sufficient to estaЬlisl1 complete dissociatioп and ioнizatioп. The cai·bon atoms are ionized mainly Ьу charge tiansfer from argon ioпs. Iп the sнpersonic expaпsion the gas velocity: the gas temperature and tlle GORDON CONFERENCE ON PLASМA CHEMISTRY , 15- 19 August 1988, USA l -· electron density are measured Ьу means of Doppler shift, Doppler broadening and Stark broadening of the hydrogen ,В-line respectively. The gas velocity increases from 1700 m/s in the anode nozzle to about 4000 m/s after .50 mm. Meanwhile the temperature drops from 12000 К to less than 2000 К. Therefore the plasma composition is frozen: the ratios of the densities of the several species present in the plasma hardly change. Three particle recomЬination of argon ions causes the electron temperature to remain higher than the gas temperature. Again the conservation laws for mass, momentum and energy are used to describe the supersonically expanding plasma. The agreement between model and measurements is good. А shock wave occurs at an axial position of about 50 mm. The kinetic energy of the highly directed motion is now converted partially into thermal energy. The velocity decreases to 2000 m/s, and the temperature increases (to 6000К). After the shock wave has been crossed, а subsonic, but fastly flowing (1000 m/s) plasma beam is created. The argon ions аге eliminated Ьу charge transfer to carbon atoms. Then the created carbon ions recomЬine fast. In this way the carbon ion density remains constant until all argon ions have been eliminated. Then also the carbon ion density decreases . Lowering the background pressure causes this process to slow down. The growth of the amorphous carbon coatings is studied Ьу means of in situ He-Ne ellipsometry. This technique, that uses the changes in polarizing properties of а growing film, provides the growth rate, but also the real and imaginary parts of the refractive index of the deposited material. The implementation that has been used for the experiments described in this thesis has an accuracy that allows the detection of а film thickness of 10 рт. Spectroscopic ellipsometry has been used to analyze the optical properties of the films over а large spectral range. Finally tl1e hardness of the films is estimated Ьу means of scratch tests. Tl1e deposition rates oЬtained (up to 200 nm/s) exceed the l1i,ghest values (for amшphous сагЬоn coatings) Ieported in tl1e liteгature so fai- l)y а factoг of 30. One can conclude that the chosen, unconventional approacl1 to plasma deposition, as it is illustrated in this paper. offers а drastic increase of' the deposition гаtе \Vhile tl1e quality of the deposited films is at least as good as the ones oЬtained Ьу mше co11Yentional processes. References 1) G.M.W. Kroesen: Plasma deposition: inYestigations on а ne,v approach, Pl1. D. Tl1esis, UпiYeisity of Technology, Eindhoven, the :Netherlands 2 

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Dynamics of an expanding arc plasma used for plasma deposition

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 Dynamics of an expanding arc plasma used for plasmadepositionCitation for published version (APA):Kroesen, G. M. W., & Schram, D. C. (1988). Dynamics of an expanding arc plasma used for plasma deposition.In Gordon Research Conference on Plasma Chemistry (10th), Held in Tilton, New Hampshire on August 15-19,1988Document status and date:Published: 01/01/1988Document Version:Accepted manuscript including changes made at the peer-review stagePlease check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can beimportant differences between the submitted version and the official published version of record. Peopleinterested in the research are advised to contact the author for the final version of the publication, or visit theDOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and pagenumbers.Link to publicationGeneral rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright ownersand it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.            • Users may download and print one copy of any publication from the public portal for the purpose of private study or research.            • You may not further distribute the material or use it for any profit-making activity or commercial gain            • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the “Taverne” license above, pleasefollow below link for the End User Agreement:www.tue.nl/taverneTake down policyIf you believe that this document breaches copyright please contact us at:openaccess@tue.nlproviding details and we will investigate your claim.Download date: 05. Oct. 2023Dynamics of an expanding arc plasma used for plasma deposition G.:М.W. Kroesen and D.C. Schram, university of Technology, Dept. of Physics, Р.О. Вох 513, 5600 МВ Eindhoven, the Netherlands. In the reactor that is used in this work the three most important functions ( dissociation and ionization, transport and deposition) are spatially separated, and each of them is optimized separately1. А cascaded arc plasma in argon is used to dissociate and ionize the injected methane and acetylene molecules. The produced reactive particles are transported efficiently towards the substrate Ьу means of а supersonic expansion into vacuum and а subsonic plasma beam. On the substrate an amorphous carbon film is growing. The flowing plasma in the cascaded arc is analyzed with diagnostics and models. The electron density and the electron temperature are measured as а function of position in the arc Ьу means of Stark broadening of the hydrogen н,3-line (486.1 nm) and the ratio of continuum- and line emission respectively. Together with the measured axial pressure profiles these measurements have been used to calculate the profiles of the gas temperature from а best fit of the quasi one-dimensional model to the experimental profiles. Then the overpopulation of the neutгal argon ground level has been calculated. In the beginning of the arc channel tl1is overpopulation amounts to а factoг 40, independent of the gas flow. Energy considerations have shown that а large amount of the dissipated electi-ical energy ( about 60%) is used to heat the originally cold argon gas. The ionization of argon atoms takes the other 40%. The pressure drop over the arc channel is associated with viscous friction bet,veen the arc vvall and the plasma. The flow has been analyzed numerically нsin,g t lle conservation laws for mass, momentum and energy. The oЬtained i-elation betvveen tl1e friction factor and tl1e Reynolds пumber lias а sti-on,g IesemЫance t.o t l1e tl1eoтetical curve for laminar flow throнgl1 а perfectly sшooth duct. Tl1e dissociation of the injected methane is analyzed using the conseп·ation la'NS for mass and energy. Tl1e calculatioпs iпdicate that an aic length of 2 сш afteI i11jectio11 of the methane is sufficient to estaЬlisl1 complete dissociatioп and ioнizatioп. The cai·bon atoms are ionized mainly Ьу charge tiansfer from argon ioпs. Iп the sнpersonic expaпsion the gas velocity: the gas temperature and tlle GORDON CONFERENCE ON PLASМA CHEMISTRY , 15- 19 August 1988, USA l -· electron density are measured Ьу means of Doppler shift, Doppler broadening and Stark broadening of the hydrogen ,В-line respectively. The gas velocity increases from 1700 m/s in the anode nozzle to about 4000 m/s after .50 mm. Meanwhile the temperature drops from 12000 К to less than 2000 К. Therefore the plasma composition is frozen: the ratios of the densities of the several species present in the plasma hardly change. Three particle recomЬination of argon ions causes the electron temperature to remain higher than the gas temperature. Again the conservation laws for mass, momentum and energy are used to describe the supersonically expanding plasma. The agreement between model and measurements is good. А shock wave occurs at an axial position of about 50 mm. The kinetic energy of the highly directed motion is now converted partially into thermal energy. The velocity decreases to 2000 m/s, and the temperature increases (to 6000К). After the shock wave has been crossed, а subsonic, but fastly flowing (1000 m/s) plasma beam is created. The argon ions аге eliminated Ьу charge transfer to carbon atoms. Then the created carbon ions recomЬine fast. In this way the carbon ion density remains constant until all argon ions have been eliminated. Then also the carbon ion density decreases . Lowering the background pressure causes this process to slow down. The growth of the amorphous carbon coatings is studied Ьу means of in situ He-Ne ellipsometry. This technique, that uses the changes in polarizing properties of а growing film, provides the growth rate, but also the real and imaginary parts of the refractive index of the deposited material. The implementation that has been used for the experiments described in this thesis has an accuracy that allows the detection of а film thickness of 10 рт. Spectroscopic ellipsometry has been used to analyze the optical properties of the films over а large spectral range. Finally tl1e hardness of the films is estimated Ьу means of scratch tests. Tl1e deposition rates oЬtained (up to 200 nm/s) exceed the l1i,ghest values (for amшphous сагЬоn coatings) Ieported in tl1e liteгature so fai- l)y а factoг of 30. One can conclude that the chosen, unconventional approacl1 to plasma deposition, as it is illustrated in this paper. offers а drastic increase of' the deposition гаtе \Vhile tl1e quality of the deposited films is at least as good as the ones oЬtained Ьу mше co11Yentional processes. References 1) G.M.W. Kroesen: Plasma deposition: inYestigations on а ne,v approach, Pl1. D. Tl1esis, UпiYeisity of Technology, Eindhoven, the :Netherlands 2 

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Dynamics of an expanding arc plasma used for plasma deposition

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