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Positive resist for UV and X-ray lithography synthesized through sol–gel chemistry
Authors
A Dabrowski
A Pistore
+24 more
A Thompson
Alessandro Carpentiero
Anna Pistore
C Sanchez
C Sanchez
CJ Brinker
DA Loyt
F Romanato
G Brusatin
G Cerveau
G Della Giustina
Gianluca Grenci
Giovanna Brusatin
H Zhang
J Lin
KJ Shea
L Brigo
Laura Brigo
Massimo Guglielmi
Massimo Tormen
MC Harvey
P Falcaro
RMA Azzam
T Sato
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'Springer Science and Business Media LLC'
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info:doi/10.1007%2Fs10971-011-...
Last time updated on 03/12/2019