Electrical and optical characterization of a capacitively-coupled RF plasma with a pulsed argon gas injection

Abstract

International audienceNanocomposite thin film deposition using a reactor-injector of nanoparticles implies a pulsed gas injection. In a plasma, this can affect the behavior of the downstream process. Here, the case of an asymmetric low-pressure RF plasma with a pulsed argon gas injection is analyzed by electrical and optical emission spectroscopy measurements. It is found that this injection mode can highly affect the plasma stability: both the electron temperature and density are modified during the rise and the decrease of the gas pressure. A new injection mode combining continuous and pulsed injections is proposed to obtain more stable conditions