Tunable two-dimensional plasmon resonances in an InGaAs/InP high electron mobility transistor

Abstract

Voltage-tunable plasmon resonances in the two-dimensional electron gas (2DEG) of a high electron mobility transistor (HEMT) fabricated from the InGaAs/InP materials system are reported. The device was fabricated from a commercial HEMT wafer by depositing source and drain contacts using standard photolithography and a semitransparent gate contact that consisted of a 0.5 mu m period transmission grating formed by electron-beam lithography. Narrow-band resonant absorption of terahertz radiation was observed in transmission in the frequency range of 10-50 cm(-1). The resonance frequency depends on the gate-tuned sheet charge density of the 2DEG. The observed separation of resonance fundamental from its harmonics and their shift with gate bias are compared with theory