XPS and electrochemical methods have been used to investigate the influences of metalloid additives, phosphorus, carbon, boron and silicon on corrosion behaviors of amorphous iron-chromium alloys. It was found that phosphorus accelerates active dissolution prior to passivation. This leads to the rapid enrichment of trivalent chromium in the surface film and to the rapid formation of the surface film with a good protective quality. On the contrary, silicon and boron do not facilitate active dissolution and interfere the chromium enrichment in the surface film owing to incorporation of silicate and borate in the surface film
