In this manuscript, the formation of nickel nanowires (average size: several tens to hundreds of μm long
and 1.0-1.5 μm wide) at low temperature is found to be driven by dewetting of liquid organometallic
precursors during spin coating process and by self-assembly of Ni clusters. Elaboration of metallic thin
films by low temperature deposition technique makes the preparation process compatible with most of the
substrates. The use of iron and cobalt precursor shows that the process could be extended to other metallic
systems. In this work, AFM and SEM are used to follow the assembly of Ni clusters into straight or
zigzag lines. The formation of zigzag structure is specific to the Ni precursor at appropriate preparation
parameters. This template free process allows a control of anisotropic structures with homogeneous sizes
and angles on standard Si/SiO2 surface
