TiAlBN nanocomposite coating have been successfully deposited on AISI 316 substrate
via RF magnetron sputtering by varying nitrogen-to-total flow ratio (RN) of 5, 15, 20, 25%, as well
as varying substrate temperature of 100, 200, 300, and 400 ºC; using single Ti-Al-BN hot-pressed
target. Chemical compositions of the coatings were analysed using X-ray photoelectron
spectroscopy (XPS). XPS results showed that the TiAlBN nanocomposite coating reaches a nitride
saturated state at higher RN (e.g 15, 20, and 25%) and boron concentration was found to be
approximately 9 at.%. However, as the concentration of nitrogen decreases at lower RN (5%), boron
concentration was found to increase to 16.17 at. %. This is due to the increase of TiB2 phase in the
coating. Variations of substrate temperatures were found to give no significant effect on the
chemical composition of the deposited TiAlBN nanocomposite coating