Academy of Sciences and Arts of the Republic of Srpska
Doi
Abstract
Capabilities of the rf plasma beam source in deposition of ultra thin diamond like carbon for the hard disk drive applications have been studied. Nano-sized films were doped by nitrogen, hydrogen and silicon and characterized by micro Raman spectroscopy. Projected ranges of incident carbon ions into the magnetic layer as well as growing film were calculated by Monte Carlo simulation. Ion ranges at 100 eV incident energy were around 0.5 nm. With micro Raman spectroscopy is possible to qualitatively determine optimal deposition parameters and to follow changes in the film properties and carbon binding structure in amorphous matrix with hydrogen, nitrogen and silicon doping elements
