In order to clarify the changes in film structure in relation to the sputtering conditions in a facing target sputtering system, we carried out three dimensional computer simulation based on Monte Carlo method. This simulation model includes Motohiro\u27s model and Turner\u27s model. First, distribution of the incidence angles of depositing particles to the substrate plane and deposition rate of the film were calculated for various sputtering gas pressure. The calculated distribution of the incidence angles and deposition rate were cioncident well with experimental results. Then, according to the calculated angular distribution, atoms assumed to be hard spheres were deposited on substrate by using Henderson\u27s model. This simulation showed that film density decreases and film roughness increases as the sputtering gas pressure increases since the self shadowing effect becomes more prominent at a higher gas pressure. When surface migration of the deposited atoms due to thermal stimulation through lattice vibration was took into the simulation, the surface migration causes a significant increase in film density and leads to a decrease in film roughness
