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Obtaining of TiSiCN Coatings by Anodic Evaporation of Titanium and Decomposition of Hexamethyldisilazane in a Low-Pressure Arc Discharge
Authors
Y. A. Bruhanova
A. I. Menshakov
P. A. Skorynina
Publication date
1 January 2021
Publisher
'IOP Publishing'
Abstract
The method of TiSiCN-coatings deposition by anodic evaporation of Ti and decomposition of an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with a self-heated hollow cathode is investigated. The plasma composition was analyzed by optical emission spectroscopy. TiSiCN coatings with a thickness of up to 10 microns and a hardness of up to 30 GPa were obtained in 1.5 hours at a temperature of 400 C. © Published under licence by IOP Publishing Ltd.The work was supported by the Russian Science Foundation (grant no. 20-79-10059)
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Institutional repository of Ural Federal University named after the first President of Russia B.N.Yeltsin
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oai:elar.urfu.ru:10995/112055
Last time updated on 17/05/2022