Structural, morphology and composition properties of
Hafnium Oxide (HfO2) films are reported. The films were
prepared by spray pyrolysis deposition process, using
chlorides as raw materials in deionised water as solvent.
Corning glass was used as substrates at temperatures from
350°C to 600°C. X ray analysis shows an amorphous
structure at low temperatures, while substrate temperatures
higher than 400°C monoclinic phase of HfO2 appear. This
result is confirmed by TEM. Scanning electron microscopy
was use to observe the microstructure of the films; rough
surface with spherical particles are appreciated. The
chemical composition was obtain by Energy Dispersive
Spectroscopy (EDS), a rate Hf / O close to ideal (0.5) was
obtained
