Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications

Brechling, Armin; Gesheva, K.; Hachmann, Wiebke; Hamelmann, Frank; Heinzmann, Ulrich; Ivanova, T.

Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications

Authors: Armin Brechling
K. Gesheva
Wiebke Hachmann
Frank Hamelmann
Ulrich Heinzmann
T. Ivanova
Publication date: 1 January 2005
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Abstract

Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A. Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. In: ECS Proceedings; PV 2005-09. 2005: 433-433

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