Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor

Allendorf, M; Aschentrup, A; Brechling, Armin; Hamelmann, Frank; Heinzmann, Ulrich; Jutzi, Peter; Maury, F; Sandrock, J; Siemeling, U; Teyssandier, F

Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor

Authors: M Allendorf
A Aschentrup
Armin Brechling
Frank Hamelmann
Ulrich Heinzmann
Peter Jutzi
F Maury
J Sandrock
U Siemeling
F Teyssandier
Publication date: 1 January 2003
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Abstract

Hamelmann F, Brechling A, Aschentrup A, et al. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf M, Maury F, Teyssandier F, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings. 2003

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