Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components

Döhring, T.; Heidemann, B.; Heidemann, K.F.; Heinzmann, Ulrich; Hormes, J.; Kleineberg, U.; Kloidt, A.; Krumrey, M.; Müller, P.; Nolting, K.; Pröpper, M.; Rahn, S.; Schmiedeskamp, B.; Scholze, F.; Stock, H.J.; Tappe, T.

Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components

Authors: T. Döhring
B. Heidemann
K.F. Heidemann
Ulrich Heinzmann
J. Hormes
U. Kleineberg
A. Kloidt
M. Krumrey
P. Müller
K. Nolting
M. Pröpper
S. Rahn
B. Schmiedeskamp
F. Scholze
H.J. Stock
T. Tappe
Publication date: 1 January 1992
Publisher

Abstract

Kloidt A, Stock HJ, Kleineberg U, et al. Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components. Spie Proc. 1992 (Soc. Phot. Opt. Instr. Eng.). 1992;1742:593

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