‘‘Rinsing” liquids and their dynamics are interesting both fundamentally in the interaction of several classic modes of spreading, and industrially in a variety of cleaning applications, such as in the manufacturing of silicon wafers. In this paper, we investigate the time-dependent spreading behavior of a rinsing liquid across a horizontal, rotating substrate; the rinsing liquid is applied to the center of the rotating substrate as an orthogonal impinging jet of constant volumetric flow. We present experimental findings on the azimuthally averaged outer radius of the spreading liquid, in which we observed four distinct growth behaviors in time. We use lubrication theory to explain these phenomena and to define boundaries within the explored parameter space where each was observed. In the absence of rotation, capillarity dominates and the spreading radius grows as t^(4/10). When centrifugal forces dominate the spreading process, several time dependencies of the spreading radius are possible, with lubrication theory predicting exponential growth as well as power laws of t^(3/4) and t^(3/2)
