Metal thin-film deposition, over the Cr2O3 surface of CrO2 thin-film substrates, exhibits a redox reaction at the interface. The transition metal forms an oxide in combination with the reduction of the near-surface chromium oxide to Cr2O3 . The insulating barrier layer Cr2O3 increases with the formation of Pb3 O4 in Pb/Cr2O3 /CrO2 and CoO in Co/Cr2O3 /CrO2 junctions, respectively
