The magnetic properties of the soft ferromagnetic layer in magnetic tunnel junctions are one of key factors to determine the performance of magnetoresistance sensors. We use a three-step orthogonal annealing procedure to modify the nanostructures of the free layer in the magnetic tunnel junction to control features such as magnetization reversal, coercivity, exchange field, and tunnel magnetoresistance ratio. We present a sensor with an improved sensitivity as high as 3944%/mT. This magnetic sensor only dissipates 200 lW of power while operating under an applied voltage of 1V

Yin, Xiaolu

Skomski, Ralph A.

Sellmyer, David J.

Liou, Sy-Hwang

Russek, Stephen E

Evarts, Eric R

Moreland, John

Edelstein, A S

Yuan, L

Yan, M L

Shen, J

English

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David Sellmyer Publications Research Papers in Physics and Astronomy
2014
Adjusting magnetic nanostructures for high-
performance magnetic sensors
Xiaolu Yin
University of Nebraska-Lincoln
Ralph A. Skomski
University of Nebraska-Lincoln, rskomski2@unl.edu
David J. Sellmyer
University of Nebraska-Lincoln, dsellmyer@unl.edu
Sy-Hwang Liou
University of Nebraska-Lincoln, sliou@unl.edu
Stephen E. Russek
National Institute of Standard and Technology
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Yin, Xiaolu; Skomski, Ralph A.; Sellmyer, David J.; Liou, Sy-Hwang; Russek, Stephen E.; Evarts, Eric R.; Moreland, John; Edelstein, A
S.; Yuan, L; Yan, M L.; and Shen, J, "Adjusting magnetic nanostructures for high-performance magnetic sensors" (2014). David
Sellmyer Publications. 259.
http://digitalcommons.unl.edu/physicssellmyer/259
Authors
Xiaolu Yin, Ralph A. Skomski, David J. Sellmyer, Sy-Hwang Liou, Stephen E. Russek, Eric R. Evarts, John
Moreland, A S. Edelstein, L Yuan, M L. Yan, and J Shen
This article is available at DigitalCommons@University of Nebraska - Lincoln: http://digitalcommons.unl.edu/physicssellmyer/259
Adjusting magnetic nanostructures for high-performance magnetic sensors
Xiaolu Yin,1 Ralph Skomski,1 David Sellmyer,1 Sy-Hwang Liou,1,a) Stephen E. Russek,2
Eric R. Evarts,2 John Moreland,2 A. S. Edelstein,3 L. Yuan,4 M. L. Yan,4 and J. Shen4
1Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience,
University of Nebraska, Lincoln, Nebraska 68588-0299, USA
2National Institute of Standard and Technology, Boulder, Colorado 80305, USA
3US Army Research Laboratory, Adelphi, Maryland 20783, USA
4Western Digital Corporation, Fremont, California 94539, USA
(Presented 6 November 2013; received 24 September 2013; accepted 21 October 2013; published
online 3 April 2014)
The magnetic properties of the soft ferromagnetic layer in magnetic tunnel junctions are one of key
factors to determine the performance of magnetoresistance sensors. We use a three-step orthogonal
annealing procedure to modify the nanostructures of the free layer in the magnetic tunnel junction
to control features such as magnetization reversal, coercivity, exchange field, and tunnel
magnetoresistance ratio. We present a sensor with an improved sensitivity as high as 3944%/mT.
This magnetic sensor only dissipates 200 lW of power while operating under an applied voltage of
1V.VC 2014 AIP Publishing LLC. [http://dx.doi.org/10.1063/1.4870315]
Approaches to improve the sensitivity of the magnetore-
sistive sensors based on magnetic tunnel junctions (MTJs) are
to reduce sources of noise, to increase the signal, and to
understand the fundamental limitations involved. Relevant
properties, such as tunneling magnetoresistance ratio (TMR),
coercivity (Hc), exchange coupling field (He), domain struc-
tures, and noise sensitively depend on the free layer structure
in the MTJ. In recent years, a number of efforts to modify the
magnetic tunnel junction layer structures have been discussed
by several research groups.1–25 There are several concepts to
modify the magnetic properties of the free layer in magnetic
tunnel junctions such as using hard magnet or magnetic field
bias,18,19 using an orthogonal antiferromagnetic coupling
layer,20–22 using two-step orthogonal annealing.23–25
In this study, we discuss the variation of the magnetic
properties of the free layer by changing annealing conditions
that are related to the performance of the magnetoresistive
sensor. By optimizing the TMR ratio, Hc, He, domain struc-
tures and noise, we fabricate a sensor with a sensitivity as
high as 3944%/mT (with a flux concentrator). This magnetic
sensor only dissipates 200 lW of power while operating
under an applied voltage of 1V.
The MTJ layer structure used in this study is 1.5 nm
Ta/25 nm Ru/7 nm Ir20Mn80/2.2 nm Co40Fe60/0.85 nm
Ru/2.8 nm Co20Fe60B20/2 nm MgO/1.5 nm Co20Fe60B20/1 nm
Ta/15 nm Ru, as shown in Fig. 1(a). The Resistance Area
Product (RA) of the MTJ in parallel state is about
130 kXlm2. The junctions were patterned into circles with a
diameter of 30lm (16 junctions in series) by photolithogra-
phy and argon milling. The three-step orthogonal annealing
procedure is shown in Fig. 1(b). The MTJ was first annealed
at 350 C in a magnetic field of 1 T field for 1 h under a vac-
uum of 1.33 105 Pascal. This ensures that the magnetic
pinning direction of the reference layer is along an axis of the
circle. The second annealing process was done at 300 C in
0.1 T for 10 h. The magnetic field direction is perpendicular
(90) to the pinning direction of the reference layer and
ensures orthogonality between the free layer and the refer-
ence layer. The third annealing step was done at 300 C for
10 h in a magnetic field of 0.1 T that forms an angle of 270
with the pinning direction. The idea is to improve the symme-
try of the orthogonal property between the free layer and the
pinning direction of the reference layer.
The magnetic sensor used in this study was made using
an asymmetric bridge (formed by taking two dies and rotat-
ing them so that the pinned directions were opposite to each
other).16,24,25 The sensor voltage and preamplifier bias are
supplied by batteries to minimize noise. The magnetic flux
concentrator (MFC) was made using a Conetic alloy which
was annealed in hydrogen at 1150 C for 20 h with cooling
rate about 1 C/min. The shape design of Magnetic Flux
Concentrator was also important for the amplitude of magni-
fication and discussed in our previous work.16 The gap
between the concentrators was about 0.8mm.
The magnetic properties of MTJ, such as magnetization
reversal behavior, magnetic coercivity (Hc), exchange cou-
pling field (He), and TMR ratio, are very sensitive to the
annealing conditions. As shown in Fig. 2, the sample was
annealed at 350 C in a magnetic field of 1 T, which set the
pinning layer direction. The TMR ratio of this sample is
about 159%. The slope of the TMR loop at the zero-magnetic
field is very small.
In order to improve the zero-field slope, the second
annealing process was used. The sample was heated to 300 C
in a magnetic field of 0.1 T, which set the easy axis of the free
layer. The second annealing process helps the magnetization
in free layer to keep orthogonal with pin layer magnetization.
The zero-field slope of the TMR loop (blue line in Fig. 2),
which is proportional to the sensitivity of the sensor, is
increased by about 8 times. The TMR ratio remains about the
same (150%) after the second annealing process. However,
a)Author to whom correspondence should be addressed. Electronic mail:
sliou@unl.edu.
0021-8979/2014/115(17)/17E528/3/$30.00 VC 2014 AIP Publishing LLC115, 17E528-1
JOURNAL OF APPLIED PHYSICS 115, 17E528 (2014)
 
the coercivity Hc decreases from 1.13mT after the first
annealing to 0.87mT after the second annealing. The
exchange-coupling field He also decreases, from0.33mT af-
ter the first annealing to 0.10mT after the second annealing.
We have tried to improve orthogonality between the
free layer and the pinning direction of the reference layer by
a third annealing process. We find that the TMR ratio of the
sample increases to about 213% and the coercivity decreases
to 0.66mT. The exchange-coupling field also increases, to
0.35mT after the third annealing.
The zero-field slope of TMR loop (sensitivity of the sen-
sor, red line in Fig. 2) increases by about 13 times compared to
the first annealing. The improvement of the symmetry of the
MR loop of the sample may due to the better crystal orienta-
tion of the ferromagnetic layers as well as the MgO insulator
layer. The slope (dR/dH) at zero magnetic field significantly
increased after third annealing. Figure 3 compares the field-
dependences of the resistivity (magnetization) after the second
and third annealing steps by scanning a magnetic field range of
6100mT. There is little difference between the parallel states
(P states) after the second and third annealing steps. However,
the MR loop of anti-parallel states (AP states) is more field-
dependent after the third annealing step than that of the second
step annealing. This indicates an additional reduction of the
pinning strength after the third annealing process. One possible
reason is that the AFM/FM coupling (Ir20Mn80/Co40Fe60)
diminishes due to the diffusion of Mn at the interface forms af-
ter a high temperature and a long time (20 h) annealing.
Another possible reason is that inter-diffusion of Ru occurs at
the interface of the artificial antiferrimagnetic coupling layers
(Co40Fe60/Ru/Co20Fe60B20).
We also observed the TMR ratios of 205% and 236%
for the second and third annealing, respectively. These val-
ues are much higher than those calculated from the low-field
magnetic field MR loop. We could conclude that the low-
field MR loops are all minor loops, that is, the magnetization
reversal of free layer is strongly coupled to the pinning layer.
Our magnetic sensor was fabricated in form of an asym-
metric bridge (the Wheatstone bridge 64 MTJ junctions).
Figure 4 shows the sensor voltage output as a function of the
magnetic field, operating under an applied voltage of 1V.
Without magnetic flux concentrator, the sensor exhibits a
fairly large magnetic hysteresis in the magnetic field range
FIG. 2. TMR hysteresis loops for sample with the free layer thickness of
1.5 nm CoFeB. The black MR loop was measured after the first annealing at
350 C in a magnetic field of 1T, which sets the pin layer direction. The blue
MR loop is after the second annealing at 300 C in a magnetic field of 0.1T,
which sets the easy axis of the free layer. The red MR loop is after third
annealing at 300 C in a field of 0.1, which improves the orthogonality of the
free layer. The slopes of the TMR loops at zero magnetic field are marked in
blue and red lines to illustrate the changing sensitivity due to annealing.
FIG. 3. TMR curves measured in fields from 100mT to 100mT in the
easy axis direction of the reference electrode after the second annealing and
after the third annealing.
FIG. 1. Schematic MTJ structures: (a) layer sequence and (b) three-step or-
thogonal annealing procedures.
FIG. 4. Sensor output voltage (Vout) as a function of the magnetic field
under an applied voltage of 1 V: (a) without and (b) with MFC.
17E528-2 Yin et al. J. Appl. Phys. 115, 17E528 (2014)
 
of66mT. As shown in Fig. 4(b), the sensitivity of the sensor
substantially improves if a magnetic flux concentrator is
used. The flux concentrator was made from Conetic alloy,
annealed in hydrogen at 1150 C for 20 h. The signal of the
magnetic sensor bridge with magnetic flux concentrators
increases by a factor of 125. Figure 5 shows that we have
achieved a sensitivity as high as 3944%/mT, with an excel-
lent linearity between output voltage and DC magnetic field
in the range of 6125 nT.
Figure 6 shows a real-time magnetic response curve,
measured under a step variation of magnetic field at 1 sec
and amplitude of 0.7 nT. The applied voltage on the sensor
bridge was kept at 1V and under ambient condition. The
magnetic sensor was placed inside a coil and the signal was
collected by a low-noise amplifier and an A/D convertor. As
shown in Fig. 6, the output voltage of the magnetic sensor
clearly resolves the 0.7 nT magnetic-field steps. The output
voltage of the sensor with a sensitivity of 39.4 lV/nT
responses to 0.7 nT field step with low-noise amplifier gain
set at 20 is about 550 lV.
In summary, we have presented a three-step annealing
method that modifies the magnetic nanostructure of the free
layer in MTJ magnetic sensors. We have achieved a TMR ra-
tio of 236% by long-time annealing at 300 C in a magnetic
field of 0.1 T perpendicular to the hard axis of pinned layer.
We show that the sensor has a very high degree of linearity
in the field range of 6100 nT and a sensitivity as high as
3944%/mT, which is the highest value has been reported so
far. The sensor only dissipates 200 lW of power while oper-
ating under an applied voltage of 1V.
This work was supported by DOD (ARO, W911NF-09-
2-0039, W911NF-10-2-0099), Western Digital Corporation
for the fabrication of MTJ multilayer and NSF through
Nebraska MRSEC (DMR-0820521) for magnetic
characterizations.
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FIG. 5. Output voltage of the magnetic sensor in response to increasing and
decreasing DC magnetic fields in the range of 6125 nT. The applied voltage
is 1 V, and the sensitivity of this sensor is 3944%/mT with external magnetic
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FIG. 6. Output voltage of the magnetic sensor in response to a changing DC
magnetic field with 0.7 nT steps, with an applied voltage of 1 V.
17E528-3 Yin et al. J. Appl. Phys. 115, 17E528 (2014)
 


Adjusting magnetic nanostructures for high-performance magnetic sensors

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Adjusting magnetic nanostructures for high-performance magnetic sensors

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