Titanium oxide thin films were deposited on Si monocrystalline substrate using the pulsed laser ablation
technique in a reactive oxygen atmosphere. The films were obtained starting from Ti and TiO2 targets which
were ablated using a KrF* excimer laser (λ = 248 nm). During the deposition, the Si substrates were heated at
300 °C under various high purity oxygen atmosphere of 1.0, 0.5 and 0.1 mbar. Grazing incidence X-ray
diffraction investigations revealed the presence of a nanostructured film consisting of a mixture of several
titanium oxides, with crystalline grains size of few nm to 10 nm. Only the film deposited from the Ti target at a
pressure of 1.0 mbar exhibited crystalline grains of 30-40 nm. Thin films surface morphology and topography,
studied using atomic force and scanning electron microscopy, revealed a relatively smooth surface with the
presence of some submicron droplets, typical for laser ablation technique. Films deposited at 0.5 mbar pressure
from both targets were significantly rougher than the other deposited film
