Carbonization in boron-ion-implanted polymethylmethacrylate as revealed from Raman spectroscopy and electrical measurements

Abstract

© 2016 Taylor and Francis Group, LLC. The results of Raman spectroscopy and electrical measurements of 40 keV boron-ion-implanted polymethylmethacrylate with ion doses from 6.25 × 1014 to 5.0 × 1016 ions/cm2 are reported for the first time. The Raman spectra recorded in the 400-3800 cm-1 range, showing the formation of new carbon-carbon bands for the as-implanted samples at higher ion doses (>1016 ions/cm2), are found to be an additional support for carbonization processes earlier revealed by slow positrons. The current-voltage dependences at 360 K testify also that the as-implanted samples examined with higher fluences (3.75 × 1016 and 5.0 × 1016 ions/cm2) have created a very thin conductive layer or conductive joints due to carbonization