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Creation of lithographic masks using a scanning probe microscope
Authors
Bizyaev D.
Bukharaev A.
+4 more
Chuklanov A.
Khanipov T.
Nurgazizov N.
Ziganshina S.
Publication date
1 January 2015
Publisher
Abstract
© 2015, Pleiades Publishing, Ltd. The experimental results on scanning probe lithography (SPL)—the formation of lithographic masks using scanning probe microscope—are presented. Polymethylmethacrylate (PMMA)-based masks prepared by the SPL method are used to form metal nanoparticles of the specified sizes and shape, as well as the metallic nanowires connecting the contact areas. The analysis of various SPL modes showed that the procedure of point indentation with the switched-on microscope feedback is optimal for the formation of round nanoparticles. When forming the rectangular particles, the procedure of multiple scanning of one region in the contact mode is optimal. The quality of lithographic masks can be substantially increased by the additional use of chemical etching to remove excess PMMA after the mask is formed. The topography and magnetization structure of the formed structures were monitored by atomic force microscopy and magnetic force microscopy
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Kazan Federal University Digital Repository
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oai:dspace.kpfu.ru:net/102417
Last time updated on 07/05/2019
Kazan Federal University Digital Repository
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:dspace.kpfu.ru:net/138006
Last time updated on 07/05/2019