Banine, VY Vadim

Beckers, J Job

Osorio, EA

Reefman, P Pim

Ven, THM Tijn  van de

van de Ven, T.H.M.

Reefman, P.

Osorio, E.A.

Banine, V.Y.

Beckers, J.

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 First-ever measurements of ion energy distribution functions inEUV induced plasmaCitation for published version (APA):van de Ven, T. H. M., Reefman, P., Osorio, E. A., Banine, V. Y., & Beckers, J. (2016). First-ever measurementsof ion energy distribution functions in EUV induced plasma. Poster session presented at 28th NNV Symposiumon Plasma Physics and Radiation Technology, March 15-16, 2016, Lunteren, The Netherlands, Lunteren,Netherlands.Document license:OtherDocument status and date:Published: 16/03/2016Document Version:Publisher’s PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can beimportant differences between the submitted version and the official published version of record. Peopleinterested in the research are advised to contact the author for the final version of the publication, or visit theDOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and pagenumbers.Link to publicationGeneral rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright ownersand it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.            • Users may download and print one copy of any publication from the public portal for the purpose of private study or research.            • You may not further distribute the material or use it for any profit-making activity or commercial gain            • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the “Taverne” license above, pleasefollow below link for the End User Agreement:www.tue.nl/taverneTake down policyIf you believe that this document breaches copyright please contact us at:openaccess@tue.nlproviding details and we will investigate your claim.Download date: 15. Jul. 2024/ Department of Applied Physics28th NNV-SYMPOSIUM on Plasma Physics and Radiation Technology15 and 16 March 2016, Congress Hotel ‘De Werelt’, Lunteren, The NetherlandsExperimental setupThe setup consist of a EUV source, collector ves-sel and measurement vessel. The EQP can be positioned in multiple configurations.Spectral effectsThe spectrum produced by the EUV source also contains substantial amounts of lower energy Vacuum UV. A spectral filter, with a pass band of 10-20nm can be used to reduce this out of band radiation.• IEDFs of different species react similar to change in spectrum• VUV increases the ions density due to larger ionization cross section• Addition of VUV doesn’t change IEDF shape• High spectral power creates a high energy shoulderSurface interactionsIEDFs has been measured with the EQP in parallel and perpendicular configura-tion. In the perpendicular configuration EUV light hits the EQP sample plate. In the parallel configuration there are no surfaces exposed to EUV.               • H2+ is converted to H3+ by collisions with background: H2+ + H2 →  H + H3+• Secondary electrons reduce the Te and Vplasma and thereby the ion energyIntroductionThe EUV sources for ASML’s next-genlithography tools allow us to investigate EUV induced plasmas, which up  to recently, have been exclusively investigated by astronomers. EUV-induced plasmas are of significant im-protance with respect to the lifetime of com-ponents in EUV lithography tools. An impor-tant parameter is the ion energy distribution function (IEDF).For the first time ion energy distribution func-tions (IEDFs) have been measured in an EUV induced plasma FIRST-EVER MEASUREMENTS OF ION ENERGY DISTRIBUTION FUNCTIONS IN EUV INDUCED PLASMAT.H.M. van de Ven1, P. Reefman1, E.A. Osorio2, V.Y. Banine1,2, J. Beckers11Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands2ASML, De Run 6501, 5504 DR Velhoven, The Netherlandst.h.m.v.d.ven@tue.nlReferences[1] Erik Kieft, A relative calibration of the ISAN grazing incidence VUV spectrometer and calibrated spectra of xenon and tin, Thesis TU/e, March 19, 2004[2] Based on [1] and Filter Transmission Calibration Certificate, Physikalisch-Technische Bundesanstalt (PTB),  Braunschweig und Berlin, 2015The Helix Nebula: a Gaseous Envelope Expelled By a Dying StarNASA, ESA, C.R. O’Dell (Vanderbilt University), M. Meixner and P. McCullough (STScI)Energy filter(ESA)Ion opticsSamplingorifice Mass filter(QMS)Detector(SEM)zzyx EQPEQPEUV-beamCollector mirrorsXe discharge(EUV source)ConeOpticalfilterReductionplateFocusSource Collector MeasurementvesselParallelconfigurationPerpendicularconfiguration0 2 4 6 8 10 12 14 16 18 20102103104105Energy (eV )Ionflux(counts/s/eV)(V)UV + EUV 30%(V)UV + EUV 100%EUV 100%EUV induced plasma0 5 10 15 20 25101102103104105106107Energy (eV)Ionflux(counst/s/eV)H+H+2H+30 5 10 15 20 25101102103104105106107Energy (eV)Ionflux(counst/s/eV)H+H+2H+3Outlook• Verify numerical (PIC) models made by D. Astakhov (ISAN, Russia)• Quantification of ion fluxes to assess EUVL tool lifetime• Investigate scaling laws to deduce ion dynamicsHH +-+92 eV 76 eVHH +--- +76 eVSetup used, showing the hardware for EUV creation and the measurement equipment.The Electrostatic Quadrupole Plasma analyser (EQP) used to measure IEDFs.• Bulk has low energy (<5 eV)• Energy tail up to 22 eV• H2+ density much lower than H3+• Broad distribution• Energy cut-off at 18 eVIEDF of H+ measured with and without Spectral Purity Filter. The filter reduces the total power with 70%, therefore a measurement is done with a reduction plate of 30%. 13.5 20 30 40 50 60 70 8010−710−610−510−410−310−210−1Wavelength (nm)Intensity(arb.unit)Without filterWith Spectral Purity FilterThe radiation spectrum without[1] and with[2] filter.300 μJ / pulsePerpendicular ParallelIEDFs of hydrogen ions measured in the parallel configuration. The distance from the EUV beam to the EQP was 2,5 cm.IEDFs of hydrogen ions measured in the perpendicular configuration.

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First-ever measurements of ion energy distribution functions in EUV induced plasma

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First-ever measurements of ion energy distribution functions in EUV induced plasma

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