Brugger, J.

Heinzelmann, H.

Hinderling, Ch

Pugin, R.

Sivashankar, K.

Vancso, J.

Hinderling, Ch.

University of Twente Research Information

European Cells and Materials Vol. 6. Suppl. 1, 2003 (page 66)                                         ISSN 1473-2262Poster ID: 205 COMBINING POLYMER DEMIXING AND MICROPHASE SEPARATION OF BLOCK COPOLYMERS TO OBTAIN STRUCTURING ON DIFFERENT SCALES K.Sivashankar1, R.Pugin1, J.Brugger2, J.Vancso3, H.Heinzelmann1 & Ch.Hinderling11Centre Suisse d’Electronique et de Microtechnique (CSEM), Neuchâtel, Switzerland. 2Institute of Microtechnology and Microsystems, EPFL, Lausanne, Switzerland. 3MESA+ Research Institute,Department of Materials Science and Technology of Polymers, University of Twente, Netherlands. INTRODUCTION: Patterning of surfaces has been of particular interest in trying to achieve chosen functionalization at desired areas of the substrate1,2,3.Block copolymers have been a favorite choice due to their ability for nanoscale self - organization. This work demonstrates the use of phase separation of homopolymer/block copolymer blends to form larger structures (~100nm) and incorporate the smaller microphase phase separated structures (~30nm) of block co-polymer domains within them. The importance of the work lies in the tunability of structures on two different length scales METHODS: A polymer blend consisting of 1% solutions of the block co-polymer Polystyrene block Polyferrocenyldimethylsilane (PS-b-PFS, 60 kg/molPS, 17.7kg/mol PFS) and the homopolymer PMMA were prepared in toluene. The solution was spin coated at 3000 rpm on Si substrate to obtain thin films (<100nm). The samples were annealed in vacuum at 150oC for 17h and reactive ion etched with O2 plasma (50 mT, 30 W, 3min). This leaves the substrate with iron containing oxide nanoparticles in the areas initially occupied by the block copolymer 3. The ratio PMMA: PS-b-PFS in the blend was varied from 6:1 to 24:1. The structures were characterized using Atomic Force Microscopy (AFM).RESULTS & DISCUSSION: The phase separation of the PS-b-PFS block co-polymer/PMMA homopolymer blend forms PS-b-PFS domains in a continuous phase of PMMA. The size of these domains and their spacing are tunable by varying the composition of the initial blend and decreases monotonously with decrease in PS-b-PFS proportion in the blend. The additional microphase separation of the PS and PFS blocks in the block copolymer forms PFS dots in a PS matrix within these domains. Annealing of the samples increase the ordering of PFS domains. APPLICATIONS: The iron containing oxide nanoparticles formed after O2 RIE have been shown to act as etch masks to transfer the structures into Si using RIE in earlier publications4,5. Iron containing oxide nanoparticles on the patterned substrates are currently explored for use as catalyst in carbon nanotube growth. Fig. 1: AFM image of oxide nanoparticles within microstructures obtained by polymer demixing of a 6:1 PMMA: PS-b-PFS blend after O2 RIE REFERENCES: 1Xiao M. Yang, Richard D. Peters, and Paul F. Nealey, Macromolecules, 2000, 33,9575-9582. 2Richard D. Peters, Xiao M. Yang, and Paul F. Nealey Macromolecules, 2002, 35, 1822-1834. 3Yung-Hoon Ha, Joy Y. Chend, C. A. Ross, and Edwin L. Thomas, Langmuir, 2003, 18, 6719. 4Rob G. H. Lammertink, Mark A. Hempenius, Jan E. van de Enk, Vanessa Z.-H. Chan, Edwin L. Thomas and G. Julius Vancso Advanced Materials2000, 12, vol 2, p98. 5Rob. G. H. Lammertink, Mark A. Hempenius, Vanessa Z. –H. Chan, Edwin L. Thomas, and G. Julius Vancso, Chem. Mater. 2001, 13, 429-434 ACKNOWLEDGEMENTS: This work was supported by the NCCR “Nanoscale Science” and the European POLYNANO network. The authors thank Igor Korczagin (University of Twente) for synthesis of the PS-b-PFS block copolymer. 

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Combining polymer demixing and microphase separation of block copolymers to obtain structuring on different scales

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Combining polymer demixing and microphase separation of block copolymers to obtain structuring on different scales

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