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Tantalum‐based diffusion barriers in Si/Cu VLSI metallizations
Authors
Dobisz E. A.
E. Kolawa
+15 more
Holloway K.
Hornstrom S. E.
J. S. Chen
J. S. Reid
Kattelus H. P.
Koster U.
M.‐A. Nicolet
Nicolet M-A.
Nicolet M-A.
P. J. Pokela
Thomas R. E.
Thomas R. E.
Wang S. Q.
Wiley J. D.
Yoshitake T.
Publication date
Publisher
'AIP Publishing'
Doi
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Last time updated on 17/02/2019