The knowledge of how oxygen atoms are distributed at a magnetic-metal /
oxide, or magnetic-metal / non-magnetic-metal interface, can be an useful tool
to optimize device production. Multilayered Ni81Fe19 / Ta samples consisting of
15 bilayers of 2.5 nm each, grown onto glass substrates by magnetron sputtering
from Ni81Fe19 and Ta targets, have been investigated. X-ray absorption near
edge structure, extended X-Ray absorption fine structure, small angle X-ray
diffraction, and simulations, were used to characterize the samples. Oxygen
atoms incorporated onto Ni81Fe19 films during O2 exposition are mainly bonded
to Fe atoms. This partial oxidation of the Ni81Fe19 surface works as a barrier
to arriving Ta atoms, preventing intermixing at the Ni81Fe19 / Ta interface.
The reduction of the Ni81Fe19 surface by the formation of TaO x is observed.Comment: 14 pages, 9 figures, accepted for publication in Advances in
Materials Science and Engineerin