In this work, the influence of N,N-dimethylaniline (DMA) as inhibition agent for copper corrosion process has been studied. The electrochemical behaviour of DMA on platinum and copper electrodes in acid solutions has been analyzed by cyclic voltammetry. Inhibitory properties of DMA for copper corrosion protection were studied in 0.5 M H2SO4 solutions in the presence of different concentrations of inhibitor 10-6 M and 10-3 M, respectively. The morphology of copper samples obtained in the absence and presence of DMA has been studied by scanning electron microscopy (SEM)
