Thermal
diffusion of CO adsorbed on rutile TiO<sub>2</sub>(110)
was studied in the 20–110 K range using photon-stimulated desorption
(PSD), temperature-programmed desorption (TPD), and scanning tunneling
microscopy. During UV irradiation, CO desorbs from certain photoactive
sites (e.g., oxygen vacancies). This phenomenon was exploited to study
CO thermal diffusion in three steps: first, empty these sites during
a first irradiation cycle, then replenish them with CO during annealing,
and finally probe the active site occupancy in the second PSD cycle.
The PSD and TPD experiments show that the CO diffusion rate correlates
with the CO adsorption energystronger binding corresponds
to slower diffusion. Increasing the CO coverage from 0.06 to 0.44
monolayer (ML) or hydroxylation of the surface decreases the CO binding
and increases the CO diffusion rate. Relative to the reduced surface,
the CO adsorption energy increases and the diffusion decreases on
the oxidized surface. The CO diffusion kinetics can be modeled satisfactorily
as an Arrhenius process with a “normal” prefactor (i.e.,
ν = 10<sup>12</sup> s<sup>–1</sup>) and a Gaussian distribution
of activation energies where the peak of the distribution is ∼0.26
eV and the full width at half-maximum (fwhm) is ∼0.1 eV at
the lowest coverage. The observations are consistent with a significant
electrostatic component of the CO binding energy on the TiO<sub>2</sub>(110) surface which is affected by changes in the surface dipole
and dipole–dipole interactions