The emphasis of this work is on the fabrication of a micro separation column for applicaton in
miniaturized gas chromatography system. The micro column was made by microchannels fabricated
on the silicon wafer and sealed with a glass lid. The microchannels were fabricated by wet etching
process and the channels were of length 2m , width 200 μm and depth 100 μm. The channels were
closed by sealing with Pyrex glass. Silicide bonding was done for the bonding of silicon with Pyrex
glass. Ti was used as an intermediate layer and bonded at a temperature of 377 ◦C and a force of
1kN. During bonding Ti forms an alloy with silicon and forms Titanium silicide and this helps to
bond the glass wafer with silicom wafer with microchannels etched on it
