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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 5 : new materials, processes and equipment
Authors
E.P. Gusev
H. Iwai
+4Â more
D.-L. Kwong
V. Narayan
F. Roozeboom
P.J. Timans
Publication date
1 January 2009
Publisher
Electrochemical Society, Inc.
Abstract
Proceedings of the 215th ECS Meeting, May 24 - May 29, 2009, San Francisco, C
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Last time updated on 18/06/2018