Self-Wrinkling Patterned
Surface of Photocuring Coating
Induced by the Fluorinated POSS Containing Thiol Groups (F-POSS-SH)
as the Reactive Nanoadditive
- Publication date
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Abstract
We here demonstrate a facile approach of one-step to
obtain the
complex wrinkling patterned surface of the photocuring coating by
using thiol and fluorocarbon chains containing POSS (F<sub>2</sub>-POSS-SH<sub>6</sub>) as reactive nanoadditive. F<sub>2</sub>-POSS-SH<sub>6</sub> can self-assemble into the top layer of the UV-curing liquid
resin. As a result, the mismatch of shrinkage caused by the different
types of photo-cross-linking reaction between the top layer and bulk
layer leads to formation of the wrinkling pattern. The characteristic
wavelength (位) and amplitude (<i>A</i>) are linearly
dependent on the concentration of F<sub>2</sub>-POSS-SH<sub>6</sub>. The resulting surface exhibits superlow surface energy (4.1 mN/m)
when the concentration of F<sub>2</sub>-POSS-SH<sub>6</sub> is only
1%. The feasibility and generality of this approach for the excellent
hydrophobic and oleophobic surface will undoubtedly find practical
application in photocuring coating with functions such as self-cleaning