An Extremely Simple and
Effective Strategy to Tailor
the Surface Performance of Inorganic Substrates by Two New Photochemical
Reactions
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Abstract
This article reports on a new sequential strategy to
fabricate
monolayer functional organosilane films on inorganic substrate surfaces,
and subsequently, to pattern them by two new photochemical reactions.
(1) By using UV light (254 nm) plus dimethylformamide (DMF), a functional
silane monolayer film could be fabricated quickly (within minutes)
under ambient temperature. (2) The organic groups of the formed films
became decomposed in a few minutes with UV irradiation coupled with
a water solution of ammonium persulfate (APS). (3) When two photochemical
reactions were sequentially combined, a high-quality patterned functional
surface could be obtained thanks to the photomask