Orthogonal Patterning of Multiple Biomolecules Using
an Organic Fluorinated Resist and Imprint Lithography
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Abstract
The ability to spatially deposit
multiple biomolecules onto a single
surface with high-resolution while retaining biomolecule stability
and integrity is critical to the development of micro- and nanoscale
biodevices. While conventional lithographic patterning methods are
attractive for this application, they typically require the use of
UV exposure and/or harsh solvents and imaging materials, which may
be damaging to fragile biomolecules. Here, we report the development
of a new patterning process based on a fluorinated patterning material
that is soluble in hydrofluoroether solvents, which we show to be
benign to biomolecules, including proteins and DNA. We demonstrate
the implementation of these materials into an orthogonal processing
system for patterning multibiomolecule arrays by imprint lithography
at room temperature. We further showcase this method’s capacity
for fabricating patterns of receptor-specific ligands for fundamental
cell studies