Abstract

Molybdenum disulfide (MoS<sub>2</sub>) is back in the spotlight because of the indirect-to-direct bandgap tunability and valley related physics emerging in the monolayer regime. However, rigorous control of the monolayer thickness is still a huge challenge for commonly utilized physical exfoliation and chemical synthesis methods. Herein, we have successfully grown predominantly monolayer MoS<sub>2</sub> on an inert and nearly lattice-matching mica substrate by using a low-pressure chemical vapor deposition method. The growth is proposed to be mediated by an epitaxial mechanism, and the epitaxial monolayer MoS<sub>2</sub> is intrinsically strained on mica due to a small adlayer-substrate lattice mismatch (∼2.7%). Photoluminescence (PL) measurements indicate strong single-exciton emission in as-grown MoS<sub>2</sub> and room-temperature PL helicity (circular polarization ∼0.35) on transferred samples, providing straightforward proof of the high quality of the prepared monolayer crystals. The homogeneously strained high-quality monolayer MoS<sub>2</sub> prepared in this study could competitively be exploited for a variety of future applications

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