Surface
State Recombination and Passivation in Nanocrystalline TiO<sub>2</sub> Dye-Sensitized Solar Cells
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Abstract
The
relative role of surface state recombination in dye-sensitized solar
cells is not fully understood, yet reductions in the recombination
rate are frequently attributed to the passivation of surface states.
We have investigated reports of trap state passivation using an Al<sub>2</sub>O<sub>3</sub>-coated TiO<sub>2</sub> photoanode achieved through
atomic layer deposition (ALD). Electrochemical characterization, performed
through impedance measurements and intensity modulated photovoltage
spectroscopy (IMVS), data showed that the Al<sub>2</sub>O<sub>3</sub> deposition successfully blocked electron recombination and that
the chemical capacitance of the film was unchanged after the ALD treatment.
A theoretical model outlining the recombination kinetics was applied
to the experimental data to obtain charge transfer rates from conduction
band states, exponentially distributed traps, and monoenergetic traps.
The determined electron transfer rates showed that the deposited Al<sub>2</sub>O<sub>3</sub> coating did not selectively passivate trap states
at the nanoparticle surface but reduced recombination rates equally
from both conduction band states and surface states. These results
imply that the reduction in the recombination rates reported in core–shell
structured photoanodes cannot be attributed to a modification of surface
traps, but rather to the weakened electronic coupling between electrons
in the film and the electrolyte species