Vertically Aligned Peptide Nanostructures Using Plasma-Enhanced
Chemical Vapor Deposition
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Abstract
In this study, we utilize plasma-enhanced
chemical vapor deposition
(PECVD) for the deposition of nanostructures composed of diphenylalanine.
PECVD is a solvent-free approach and allows sublimation of the peptide
to form dense, uniform arrays of peptide nanostructures on a variety
of substrates. The PECVD deposited d-diphenylalanine nanostructures
have a range of chemical and physical properties depending on the
specific discharge parameters used during the deposition process