Photoelectrochemical
Processes at n‑GaAs(100)/Aqueous
HCl Electrolyte Interface: A Synchrotron Photoemission Spectroscopy
Study of Emersed Electrodes
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Abstract
High-resolution synchrotron photoemission
spectroscopy has been
applied to detail the electrochemical and photoelectrochemical corrosion
reactions at the liquid junction n‑GaAs(100)/1 M aqueous HCl
solution. Under anodic polarization of 1.8 eV, the main process initiated
by the presence of holes in the Ga–As bonding states of the
valence band is the formation of soluble gallium chloride complexes
and insoluble elemental arsenic on the surface. In addition, arsenic
hydroxide forms, which reacts further to soluble HAsO<sub>2</sub>.
In toto, the As/Ga atomic ratio increases, which is accompanied by
an increase of the work function. The anodic decomposition reaction
is enhanced by illumination as more holes reach the n-semiconductor/electrolyte
junction. Under cathodic polarization of 1.5 eV, only minor changes
are observed in Ga and As core-level spectra, giving no indication
of corrosion, but specific adsorption of hydrated HCl molecules and/or
Cl<sup>–</sup> ions considerably modifies valence band spectra