Facile Image Patterning via Sequential Thiol–Michael/Thiol–Yne
Click Reactions
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Abstract
Freestanding substrates with high
refractive index modulation,
good oxygen resistance, and low volume shrinkage are critical in photolithography
for the purpose of high density data storage, image patterning and
anticounterfeiting. Herein, we demonstrate a novel paradigm of direct
holographic image patterning via the radical-mediated thiol–yne
click reaction subsequent to the base-catalyzed thiol-Michael addition
reaction. With the benefit of a newly synthesized alkyne monomer,
9-(2-((2-(prop-2-yn-1-yloxy)ethyl)thio)ethyl)-9<i>H</i>-carbazole
(POETEC), holograms with as high as 96% diffraction efficiency, refractive
index modulation of 0.0036, dynamic range of 5.6 per 200 μm
and volume shrinkage of 1.1%, are successfully patterned in an aerobic
environment. Uniquely and distinctly, an inhibitor is unnecessary
to prevent the initiation of the sequential reaction in this framework