Defect
Scaling with Contact Area in EGaIn-Based Junctions:
Impact on Quality, Joule Heating, and Apparent Injection Current
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Abstract
Although the tunneling rates decrease
exponentially with a decay
coefficient β close to 1.0 n<sub>C</sub><sup>–1</sup> across <i>n</i>-alkanethiolate (SC<sub><i>n</i></sub>) monolayer based tunneling junctions determined over a multitude
of test beds, the origins of the large spread of injection current
densitiesthe hypothetical current density, <i>J</i><sub>0</sub> (in A/cm<sup>2</sup>), that flows across the junction
when <i>n</i> = 0of up to 12 orders of magnitude
are unclear. Every type of junction contains a certain distribution
of defects induced by, for example, defects in the electrode materials
or impurities. This paper describes that the presence of defects in
the junctions is one of the key factors that cause an increase in
the observed values of <i>J</i><sub>0</sub>. We controlled
the number of defects in Ag<sup>TS</sup>-SC<sub><i>n</i></sub>//GaO<sub><i>x</i></sub>/EGaIn junctions by varying
the geometrical contact area (<i>A</i><sub>geo</sub>) of
the junction. The value of <i>J</i><sub>0</sub> (∼10<sup>2</sup> A/cm<sup>2</sup>) is independent of the junction size when <i>A</i><sub>geo</sub> is small (<9.6 × 10<sup>2</sup> μm<sup>2</sup>) but increased by 3 orders of magnitude (from 10<sup>2</sup> to 10<sup>5</sup> A/cm<sup>2</sup>) when <i>A</i><sub>geo</sub> increased from 9.6 × 10<sup>2</sup> to 1.8 ×
10<sup>4</sup> μm<sup>2</sup>. With increasing <i>J</i><sub>0</sub> values the yields in nonshorting junctions decreased
(from 78 to 44%) and β increased (from 1.0 to 1.2 n<sub>C</sub><sup>–1</sup>). We show that the quality of the junctions
can be qualitatively determined by examining the curvature of the
d<i>J</i>/d<i>V</i> curves (defects change the
sign of the curvature from positiveassociated with tunnelingto
negativeassociated with Joule heating) and fitting the <i>J</i>(V) curves to the full Simmons equation to (crudely) estimate
the effective separation of the top- and bottom-electrode <i>d</i><sub>eff</sub>. This analysis confirmed that the electrical
characteristics of large junctions are dominated by thin-area defects,
while small junctions are dominated by the molecular structure