Large-Area Patterning of Polyaniline Film Based on <i>in Situ</i> Self-Wrinkling and Its Reversible Doping/Dedoping
Tunability
- Publication date
- Publisher
Abstract
Here we report a simple one-pot yet
robust approach to fabricate
large-scale wrinkle patterns with reversible acid-doping/base-dedoping
tunability. A novel swelling-induced self-wrinkling mechanism is responsible
for the <i>in situ</i> growth of wrinkled polyaniline (PANI)
film on polydimethylsiloxane (PDMS) substrate. The spontaneously formed
wrinkles with controlled microstructures such as the wavelength, spatial
orientation, and location have been well regulated by PANI film thickness
(via polymerization time and monomer concentration) and PDMS substrate
modulus as well as the boundary conditions imposed by the substrate.
The results indicate that the <i>in situ</i> self-wrinkling
is highly desirable for patterning PANI film over large areas with
the instability-driven morphologies, even in the case of curved surfaces
employed. Interestingly, taking advantage of the swelling/deswelling
capability via the unique acid doping/base dedoping of PANI, we have
further realized unprecedented reversible modulation between the wrinkled
and dewrinkled states. The involved physics underlying the complicated <i>in situ</i> self-wrinkling and the reversible doping/dedoping
tunability has been revealed