Selective-Area Fluorination
of Graphene with Fluoropolymer
and Laser Irradiation
- Publication date
- Publisher
Abstract
We have devised a method to selectively fluorinate graphene
by
irradiating fluoropolymer-covered graphene with a laser. This fluoropolymer
produces active fluorine radicals under laser irradiation that react
with graphene but only in the laser-irradiated region. The kinetics
of C–F bond formation is dependent on both the laser power
and fluoropolymer thickness, proving that fluorination occurs by the
decomposition of the fluoropolymer. Fluorination leads to a dramatic
increase in the resistance of the graphene while the basic skeletal
structure of the carbon bonding network is maintained. Considering
the simplicity of the fluorination process and that it allows patterning
with a nontoxic fluoropolymer as a solid source, this method could
find application to generate fluorinated graphene in graphene-based
electronic devices such as for the electrical isolation of graphene