Light Turning Mirrors in SiON Optical Waveguides for Hybrid Integration with CMOS Photo-detectors

Abstract

A new method is proposed for hybrid integration of SiON optical waveguides and standard CMOS photo-detectors based on anisotropic etching of 45° facets in a Si substrate. After removal of anisotropically etched Si structures in cladding SiO2, the fabricated total-internal-reflection mirrors can direct the output of the waveguides to photo-detectors placed on top of the chip. The metal-free fabrication process, designed to create these mirrors, is convenient for batch production. Fourier optics based simulations predict that the reflection efficiency of the mirrors is 68.5 %. The far field pattern obtained from the fabricated device is similar to the simulated one